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    英國Nanobean NB5 電子束光刻機(jī)

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     英國Nanobean NB5 電子束光刻機(jī)


    具有良好的穩(wěn)定性,平均正常運(yùn)行時間超過93%

    Nanobean NB5 電子束光刻機(jī)

     


    規(guī)格
    :

    束流電壓范圍為: 20kV - 100kV

    光刻膠的特征尺寸: <8nm (光刻精度)

    500um區(qū)域拼接/疊加誤差: 小于25nm

    自動裝載5卡盤氣鎖系統(tǒng)

     

    NB5發(fā)展目標(biāo):

    改進(jìn)設(shè)計(jì)和組件以減少日常服務(wù)需求。

    實(shí)現(xiàn)每年少于5%的機(jī)器故障停機(jī)時間。

    提高性能

    便于批量生產(chǎn)。

     

    NB5系統(tǒng)將為進(jìn)一步發(fā)展高偏轉(zhuǎn)速度和進(jìn)一步集成電子提供平臺。

    The nB4 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times and service costs.

     

    NB5 development aims:

    Refine design and components to reduce routine service requirements.
    Achieve a machine-fault-downtime of less than 5% annually.
    Enhance performance
    Facilitate volume production.
    Specification:

    Beam Voltage range        20kV - 100kV
    Feature size on resist      <8nm
    Stitching/overlay error    <25nm for 500um field
    Automatic loading            5 chuck airlock system

    The nB5 system will provide a platform for further development to high deflection speed and further integrated electronics.

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