網(wǎng)站首頁(yè)

|EN

當(dāng)前位置: 首頁(yè) » 設(shè)備館 » 半導(dǎo)體加工設(shè)備 » 光刻設(shè)備 » UV光刻機(jī) »OAI 200型光刻機(jī)
    包郵 關(guān)注:1587

    OAI 200型光刻機(jī)

    應(yīng)用于半導(dǎo)體行業(yè):

    半導(dǎo)體加工設(shè)備-光刻設(shè)備-UV光刻機(jī)

    產(chǎn)品品牌

    OAI

    庫(kù)       存:

    10000

    產(chǎn)       地:

    全國(guó)

    數(shù)       量:

    減少 增加

    價(jià)       格:

    面議
    交易保障 擔(dān)保交易 網(wǎng)銀支付

    品牌:OAI

    型號(hào):

    所屬系列:半導(dǎo)體加工設(shè)備-光刻設(shè)備-UV光刻機(jī)

     

    200型光刻機(jī)

     

    OAI 200型光刻機(jī)是一種具有成本效益的高性能掩模對(duì)準(zhǔn)器,采用經(jīng)過(guò)行業(yè)驗(yàn)證的組件,使OAI成為光刻設(shè)備行業(yè)的領(lǐng)導(dǎo)者。 200型是臺(tái)式面罩對(duì)準(zhǔn)器,需要最小的潔凈室空間。它為研發(fā),或有限規(guī)模,試點(diǎn)生產(chǎn)提供了經(jīng)濟(jì)的替代方案。利用創(chuàng)新的空氣軸承/真空吸盤調(diào)平系統(tǒng),襯底快速平穩(wěn)地平整,用于平行光掩模對(duì)準(zhǔn)和在接觸曝光期間在晶片上的均勻接觸。該系統(tǒng)能夠?qū)崿F(xiàn)一微米分辨率和對(duì)準(zhǔn)精度。

    對(duì)準(zhǔn)模塊具有掩模插入件組和快速更換晶片卡盤,其便于使用各種襯底和掩模,而不需要用于重新配置的特殊工具。對(duì)準(zhǔn)模塊包括X,Y和Z軸的微米。

    200型掩模對(duì)準(zhǔn)器具有可靠的OAI紫外光源,其在近紫外或深紫外中提供準(zhǔn)直的紫外光,使用功率從200至2000瓦的燈。雙傳感器,光學(xué)反饋回路連接到恒定強(qiáng)度控制器,以提供在所需強(qiáng)度的±2%內(nèi)的曝光強(qiáng)度的控制。可以快速和容易地改變UV波長(zhǎng)。該掩模Aligner是一種靈活,經(jīng)濟(jì)的解決方案,適用于任何入門級(jí)掩模對(duì)準(zhǔn)和UV曝光應(yīng)

    Model 200 Mask Aligner

    光刻機(jī)Model-200 Mask Aligners 

    The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a bench top mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.

    The alignment module features mask insert sets and quick-change wafer chucks that facilitate the use of a variety of substrates and masks without requiring special tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and Z-axis.

    The Model 200 Mask Aligner features a dependable OAI UV light source which provides collimated UV light in Near or Deep UV using lamps ranging in power from 200 to 2000 watts. Dual-sensor, optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. Changes may be made to the UV wavelength quickly and easily. This mask Aligner is a flexible, economic solution for any entry-level mask alignment and UV exposure application.

    咨詢

    購(gòu)買之前,如有問(wèn)題,請(qǐng)向我們咨詢

    提問(wèn):
     

    基片的尺寸范圍多大?分辨率、對(duì)準(zhǔn)精度多高?

    sjfh  2017-08-14

    您好, 感謝您咨詢我司代理的美國(guó)OAI光刻機(jī), OAI 200型光刻機(jī)基片尺寸范圍: 8"; 分辨率1UM, 對(duì)準(zhǔn)進(jìn)度1UM;

    如有疑問(wèn), 請(qǐng)隨時(shí)聯(lián)系: 廖先生 13538131258, QQ583129932

    多謝!

    2017-08-26

    應(yīng)用于半導(dǎo)體行業(yè)的相關(guān)同類產(chǎn)品:

    服務(wù)熱線

    4001027270

    功能和特性

    價(jià)格和優(yōu)惠

    微信公眾號(hào)