200型光刻機

 

OAI 200型光刻機是一種具有成本效益的高性能掩模對準器，采用經(jīng)過行業(yè)驗證的組件，使OAI成為光刻設(shè)備行業(yè)的領(lǐng)導者。 200型是臺式面罩對準器，需要最小的潔凈室空間。它為研發(fā)，或有限規(guī)模，試點生產(chǎn)提供了經(jīng)濟的替代方案。利用創(chuàng)新的空氣軸承/真空吸盤調(diào)平系統(tǒng)，襯底快速平穩(wěn)地平整，用于平行光掩模對準和在接觸曝光期間在晶片上的均勻接觸。該系統(tǒng)能夠?qū)崿F(xiàn)一微米分辨率和對準精度。

對準模塊具有掩模插入件組和快速更換晶片卡盤，其便于使用各種襯底和掩模，而不需要用于重新配置的特殊工具。對準模塊包括X，Y和Z軸的微米。

200型掩模對準器具有可靠的OAI紫外光源，其在近紫外或深紫外中提供準直的紫外光，使用功率從200至2000瓦的燈。雙傳感器，光學反饋回路連接到恒定強度控制器，以提供在所需強度的±2％內(nèi)的曝光強度的控制?？梢钥焖俸腿菀椎馗淖僓V波長。該掩模Aligner是一種靈活，經(jīng)濟的解決方案，適用于任何入門級掩模對準和UV曝光應(yīng)用

Model 200 Mask Aligner

The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a bench top mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.

The alignment module features mask insert sets and quick-change wafer chucks that facilitate the use of a variety of substrates and masks without requiring special tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and Z-axis.

The Model 200 Mask Aligner features a dependable OAI UV light source which provides collimated UV light in Near or Deep UV using lamps ranging in power from 200 to 2000 watts. Dual-sensor, optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. Changes may be made to the UV wavelength quickly and easily. This mask Aligner is a flexible, economic solution for any entry-level mask alignment and UV exposure application.